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Center Innovation Fund: MSFC CIF

Magnetron Sputter Deposition System for the Development of Multilayer X-ray Optic, Year 1

Completed Technology Project
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Project Description

Magnetron Sputter Deposition System for the Development of Multilayer X-ray Optic, Year 1

The proposal objective is to establish the capability to deposit multilayer structures for X-ray, neutron, and EUV optic applications through the development of a magnetron sputtering deposition system. A specific goal of this endeavor is to combine multilayer deposition technology with the replication process in order to enhance the MSFC's position as a world leader in the design of innovative X-ray instrumentation through the development of full shell replicated multilayer optics. The development of multilayer structures are absolutely necessary in order to advance the field of X-ray astronomy by pushing the limit for observing the universe to ever increasing photon energies (i.e. up to 200 keV or higher); well beyond Chandra (~10 keV) and NuStar's (~75 keV) capability.

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Anticipated Benefits

Primary U.S. Work Locations and Key Partners

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