Non-NASA commercial applications include high energy laser systems, EUV optics (lithography), imaging systems and X-ray synchrotrons. High energy laser applications, such as Inertial Confinement Fusion National Ignition Facility (NIF) at Lawrence Livermore National Laboratory are susceptible to mid-spatial frequency errors. The MSF errors are a source of damaging intensity, specifically in the region of 120m 33mm. In EUV lithography, flare is a significant problem. Flare as mentioned earlier is directly associated with mid-spatial frequency error. The mid-spatial frequency errors cause light to scatter into small angles and reduce image contrast. The specific mid-spatial frequency region of interest to the EUV lithography community is between 1m 2mm. The mid-spatial frequency error scales as 1/(lambda)^2, which causes an increasingly significant problem as the lithography industry heads toward shorter and shorter wavelength systems.