Mikro Systems, Inc. (MSI) will advance the state-of-the-art in high resolution, high-aspect-ratio x-ray/gamma-ray collimator fabrication into the micro-slit regime (slit pitch on the order of 10-20 microns) through the use of an innovative hybrid micro-machining technology. To achieve high resolution imaging at hard x-ray and gamma-ray energies, grid-based optics are currently required. Fine grids, having high-aspect-ratio (>50:1) and made from dense materials, are the enabling components for solar and astrophysical imaging with high angular resolution at x-ray and gamma-ray energies. Instrumentation for these missions is severely constrained by size and mass considerations. Since the angular resolution scales with the grid-aperture to instrument-length ratio, the ability to produce grids with finer pitch has the direct result of higher angular resolution and/or overall reduction in instrument size and mass.