Skip Navigation
SBIR/STTR

Low-Stress Silicon Cladding for Surface Finishing Large UVOIR Mirrors, Phase II

Completed Technology Project

Project Introduction

In this Phase I research, ZeCoat Corporation demonstrated a low-stress silicon cladding process for surface finishing large UVOIR mirrors. A polishable cladding is desired for SiC optics so they may be figured in less time, and so they may be polished to levels suitable for UVOIR astronomy. ZeCoat has filed a provisional US patent application for the technology. The proposed process is directly scalable to SiC mirrors several meters in diameter. The process is based on a novel, low temperature, ion-assisted, evaporation technique (IAD), whereby the coating stress of a silicon film may be manipulated from compressive to tensile, in order to produce a near-zero net stress for the complete layer. A Si cladding with little intrinsic stress is essential to allow thick coatings to be manufactured without cracking. A low stress coating also minimizes substrate bending that would otherwise distort the figure of very lightweight mirrors. More »

Anticipated Benefits

Primary U.S. Work Locations and Key Partners

Share this Project

Organizational Responsibility

Project Management

Project Duration

Technology Maturity (TRL)

Technology Areas

Light bulb

Suggest an Edit

Recommend changes and additions to this project record.
^