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Center Independent Research & Development: GSFC IRAD

Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography

Completed Technology Project

Project Description

Grayscale lithography fabricated mask on HEBS glass

In this study we intend to fabricate partially transparent petal (PTP) masks using gray scale lithography on high-energy beam sensitive (HEBS) glass and evaluate its performance in on-going light suppression experiments at Goddard. Preliminary laboratory results from traditional lithography fabricated masks and our published mathematical analyses show PTP masks using gray scale lithography could achieve superior light suppression along the optical axis not obtainable with binary petaled masks. The fabrication process involving low cost gray scale lithography would enable NASA to assess the feasibility of this technology as a means of achieving 3D micro/nano fabrication processes for future device manufacturing.

Our main objective in this study is to design, fabricate, and analyze the partially transparent petaled (PTP) masks using gray scale lithography to suppress the diffracted light along the optical axis of secondary mirror of the New Space-based Gravitational-wave Observatory (NGO) telescope.

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