Chemical Mechanical Planarization technology enabling higher performance detectors, multiplexers, and microwave devices for astrophysics missions, Year 1
Project Description
Chemical Mechanical Planarization (CMP) is a technique that, among multiple benefits, provides self-alignment that enables the smaller critical feature size critical to the performance of many superconducting devices. This effort builds on an FY18 CIF, in which they leveraged local facilities (at GSFC and NIST, Gaithersburg) to develop CMP recipes for the NASA-specific, unique materials needed to further expand our ability to apply CMP for breakthrough enhancements in astrophysics instruments. The specific goal for FY19 Is to combine FY18 efforts to make a Metallic Magnetic Calorimeter structure with solenoidal geometry for enhanced energy resolution, and to start taking advantage of CMP's ability to make self-aligned structures . This innovation provides opportunities to improve sensitivity and decrease pixel size for x-ray microcalorimeters, simplify wiring, and make new types of superconducting devices or microwave components for multiplexed readout. The technology infusion target will be upcoming APRA proposals.
More »Anticipated Benefits
In many cases, detector technology developed for astrophysics applications relies on superconducting detectors, amplifiers, and wiring, and yet the fabrication methods employed so far allow for fabrication of only a small subset of useful superconducting devices. Advanced techniques for sensor fabrication, using materials suitable for NASA applications, are needed to improve sensitivity and decrease pixel size.
More »Primary U.S. Work Locations and Key Partners
| Organizations Performing Work | Role | Type | Location |
|---|---|---|---|
Goddard Space Flight Center
(GSFC)
|
Lead Organization | NASA Center | Greenbelt, Maryland |
| National Institute of Standards and Technology (NIST) | Supporting Organization | Other US Government | Boulder, Colorado |
Primary U.S. Work Locations
-
Maryland
